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Anisotropic growth of long isolated graphene ribbons on the C face of graphite-capped 6H-SiC

机译:石墨包覆的6H-SiC C面上长的孤立石墨烯带的各向异性生长

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摘要

Using a graphite cap to cover the silicon carbide (SiC) sample, it is shown that large isolated graphene anisotropic ribbons can be grown on the C face of on-axis, semi-insulating, 6H-SiC wafers. The role of the cap is to modify the physics of the surface reconstruction process during Si sublimation, making more efficient the reconstruction of few selected terraces with respect to the others. The net result is the formation of a strongly step-bunched morphology with, in between, long (up to 600 mu m) and large (up to 5 mu m) homogeneous monolayers of graphene ribbons. This is shown by optical and scanning electron microscopy, while a closer view is provided by atomic force microscopy (AFM). From Raman spectroscopy, it is shown that most of the ribbons are homogeneous monolayers or bilayers of graphene. It is also shown that most of the thermal stress between the graphene layer and the 6H-SiC substrate is relaxed by wrinkles. The wrinkles can be easily displaced by an AFM tip, which demonstrates evidence of graphene ironing at the nanoscale. Finally and despite the very low optical absorption of a single graphene layer, one shows that differential optical microtransmission can be combined to the micro-Raman analysis to confirm the monolayer character of the thinnest ribbons.
机译:使用石墨盖覆盖碳化硅(SiC)样品,结果表明,可以在轴上半绝缘6H-SiC晶片的C面上生长大型孤立的石墨烯各向异性带。顶盖的作用是在Si升华过程中修改表面重建过程的物理性质,从而使相对于其他梯田的少数选定梯田的重建效率更高。最终的结果是形成了一个强烈的阶梯状形态,在石墨烯带的长(达600微米)和大(达5微米)均匀的单层之间。光学和扫描电子显微镜显示了这一点,而原子力显微镜(AFM)提供了更近的视图。从拉曼光谱法可知,大多数带是石墨烯的均质单层或双层。还显示出,石墨烯层和6H-SiC衬底之间的大部分热应力被皱纹缓解。 AFM尖端可轻松去除皱纹,这表明了石墨烯在纳米级上的熨烫迹象。最终,尽管单个石墨烯层的光吸收率非常低,但显示微分光学透射率可以与微拉曼分析相结合,以确认最薄带的单层特性。

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